DPMAregister | Patents - ST.27-legal status data

ST.27-legal status data

The legal status information displayed below is based on WIPO Standard ST.27 and of a purely informative nature. Binding information on the status of the IP right is only available in DPMAregister (Show details).

DE file number: 103 26 223.7 (Designation/title: Verfahren zur Strukturierung dünner Schichten mittels optischer Lithographie und Anordnung zur Durchführung der optischen Lithographie)

↩ Details

Tabular representation
Current state: Not active, Current state: Termination likely/termination

Key event history
No.	Key Event Code	Key Event Name	Event Date	Effective Date	Publication Date	To Stage
1	A10	Application filed	Jun 11, 2003	Jun 11, 2003		Filing
2	D10	Search and/or examination requested or initiated	Jul 1, 2003	Jul 1, 2003		Examination
3	Q10	Document published	Jan 20, 2005	Jan 20, 2005	Jan 20, 2005	Examination
4	Q10	Document published	Jul 31, 2008	Jul 31, 2008	Jul 31, 2008	Examination
5	F10	IP right granted	Oct 31, 2008	Oct 31, 2008	Jan 29, 2009	Grant
6	H10	IP right ceased	Jan 3, 2012	Jan 3, 2012	Apr 12, 2012	Termination likely/termination

Detailed event history
No.	Detailed Event Code	Detailed Event Name	Event Date	Effective Date	Publication Date	To Stage
1	A10	Application filed	Jun 11, 2003	Jun 11, 2003		Filing
2	D11	Substantive examination requested	Jul 1, 2003	Jul 1, 2003		Examination
3	Q12	Application published	Jan 20, 2005	Jan 20, 2005	Jan 20, 2005	Examination
4	P22	Classification modified	Oct 17, 2005	Oct 17, 2005		Examination
5	D22	Grant of IP right intended	Mar 10, 2008	Mar 10, 2008		Examination
6	Q13	IP right document published	Jul 31, 2008	Jul 31, 2008	Jul 31, 2008	Examination
7	F11	IP right granted following substantive examination	Oct 31, 2008	Oct 31, 2008	Jan 29, 2009	Grant
8	H13	IP right lapsed	Jan 3, 2012	Jan 3, 2012	Apr 12, 2012	Termination likely/termination

Graphical representation

Below you will see a simplified graphical representation of the legal status information, which is based on WIPO Standard ST.27 using the "Overall Patent/SPC Prosecution Model" defined therein.