Register information Patent

DE file number : 60 2017 070 286.2 (Status: pending/in force, Query started: September 19, 2024)

Please note: This English version is a non-binding translation of the German register excerpt. Only the German version of the register excerpt is legally binding.

Master data
INIDCriterionFieldContent
Type of IP rightSARTPatent
StatusSTPending/in force
21DE file number DAKZ60 2017 070 286.2
96EP file numberEAKZ17 84 5796.6
86WO file numberWAKZPCT/JP2017/020055
97EP publication numberEPN3506355
87WO publication numberWPN2018042785
54Designation/titleTIABSTANDSSENSOR UND ABSTANDSBILDSENSOR
51IPC main classICM
(ICMV)
H04N 25/70 (2023.01)
51IPC secondary class(es)ICS
(ICSV)
H01L 27/144 (2006.01), H01L 27/146 (2006.01)
22DE application dateDATMay 30, 2017
96EP application dateEATMay 30, 2017
86WO application dateWATMay 30, 2017
43Date of first publicationOTMar 8, 2018
Date of publication of grantPETJun 14, 2023
71/73Applicant/ownerINHHamamatsu Photonics K.K., Hamamatsu-shi, Shizuoka, JP
72InventorINMASE, Mitsuhito, Hamamatsu-shi, Shizuoka 435-8558, JP; HIRAMITSU, Jun, Hamamatsu-shi, Shizuoka 435-8558, JP; SHIMADA, Akihiro, Hamamatsu-shi, Shizuoka 435-8558, JP
Address for service Marks & Clerk LLP, 1017 Luxembourg, LU
33
31
32
Foreign priorityPRC
PRNA
PRDA
JP
2016166683
Aug 29, 2016
Due dateFT
FG
May 31, 2025
Annual fee for the 9th year Patent fees
Patent division in charge 31
97EP language of publicationELANGEN - Englisch
84Designated EP contracting statesEDSAL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LI, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR
Published EP/WO documentsEPWOPNOriginal document: EP000003506355A1
Searchable text: EP000003506355A1
Original document: EP000003506355B1
Searchable text: EP000003506355B1
Original document: WO002018042785
Searchable text: WO002018042785
43Date of first publicationEVTMar 8, 2018
Date of the first transfer into DPMAregisterEREGTJul 3, 2019
Date of the (most recent) update in DPMAregisterREGTJun 6, 2024
(Show all update days)(Hide all update days)
  • Jun 6, 2024; May 9, 2024; May 2, 2024; Apr 11, 2024; Jul 18, 2023; Jun 7, 2023; May 25, 2023; Feb 9, 2023; Jan 26, 2023; Aug 15, 2019
    • Historical data not available for this/these date(s)
  • Jul 3, 2019
    • Date of the first transfer into DPMAregister
Procedural data
No. Kind of procedure Legal status Date of legal/procedural status Date of legal/procedural status sorted ascending Date of first publication Display all details
1 Procedure relating to PCT application WO publication Mar 8, 2018   Display details
2 Procedure relating to EP application EPO 1st publication Jul 3, 2019   Display details
3 Publications Publication of a mention regarding EP 1st publication by DPMA Aug 14, 2019 Aug 14, 2019 Display details
4 Change of classification Change of IPC main class Jan 9, 2023   Display details
5 Procedure relating to EP application EPO publication of mention regarding patent grant (beginning of opposition period) Jun 14, 2023   Display details
6 Publications Publication by DPMA of mention regarding EP patent grant Jun 29, 2023 Jun 29, 2023 Display details
7 Procedure relating to EP application No opposition to patent grant filed, or opposition proceedings at EPO completed without decision Mar 15, 2024 Jun 6, 2024 Display details