Register information Patent

DE file number : 11 2018 002 498.9 (Status: pending/in force, Query started: August 7, 2025)

Please note: This English version is a non-binding translation of the German register excerpt. Only the German version of the register excerpt is legally binding.

Master data
INIDCriterionFieldContent
Type of IP rightSARTPatent
StatusSTPending/in force
21DE file number DAKZ11 2018 002 498.9
86WO file numberWAKZPCT/US2018/032196
87WO publication numberWPN2018213107
54Designation/titleTIKOMBINIERTES PHYSIKALISCHES UND CHEMISCHES ÄTZEN ZUR STRUKTURURIERUNG VON MAGNETISCHEM TUNNELÜBERGANG (MTJ)
51IPC main classICM
(ICMV)		 H10N 50/01 (2023.01)
22DE application dateDATMay 11, 2018
85PCT national phase entry patentPATNATNov 15, 2019
86WO application dateWATMay 11, 2018
43Date of first publicationOTNov 22, 2018
71/73Applicant/ownerINHTaiwan Semiconductor Manufacturing Company, Ltd., Hsinchu, TW
72InventorINShen, Dongna, San Jose, CA, US; Wang, Yu-Jen, San Jose, CA, US; Tong, Ru-Ying, Los Gatos, CA, US; Sundar, Vignesh, Sunnyvale, CA, US; Patel, Sahil, Fremont, CA, US
74RepresentativeVTRBOEHMERT & BOEHMERT Anwaltspartnerschaft mbB - Patentanwälte Rechtsanwälte, 28359 Bremen, DE
10Published DE documentsDEPNOriginal document: DE112018002498T5
Searchable text: DE112018002498T5
Address for service BOEHMERT & BOEHMERT Anwaltspartnerschaft mbB - Patentanwälte Rechtsanwälte, 28359 Bremen, DE
33
31
32
Foreign priorityPRC
PRNA
PRDA
US
15/595,484
May 15, 2017
Due dateFT
FG		May 31, 2026
Annual fee for the 9th year Patent fees
Patent division in charge 33
87WO language of publicationWLANGEN - Englisch
57AbstractABProcesses for forming magnetic tunnel junction (MTJ) nanopillars (la) with minimal sidewall residue and damage are disclosed wherein a pattern is first formed in a hard mask (15) that is an uppermost MTJ layer. Thereafter, the hard mask sidewall (20) is etch transferred through the remaining MTJ layers including a tunnel barrier (13) between a free layer (14) and a reference layer (12). The etching may be completed in a single RIE step (32m) that features a physical component involving inert gas ions or plasma, and a chemical component comprised of ions or plasma generated from one or more of methanol, ethanol, ammonia, and carbon monoxide. Alternatively, a chemical treatment (33) with one of the aforementioned chemicals, and a volatilization step (34v) may follow MTJ stack patterning using an ion beam etch or RIE involving inert gas ions (32i).
81Designated WO countriesWDSAE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DJ, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JO, JP, KE, KG, KH, KN, KP, KR, KW, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW
Published EP/WO documentsEPWOPNOriginal document: WO2018213107A1
Searchable text: WO2018213107A1
56CitationsCT US020160351798A1 (US 2016 / 0 351 798 A1)
US020150017741A1 (US 2015 / 0 017 741 A1)
US020050254289A1 (US 2005 / 0 254 289 A1)
US020170125668A1 (US 2017 / 0 125 668 A1)
US020050016957A1 (US 2005 / 0 016 957 A1)
US020170069834A1 (US 2017 / 0 069 834 A1)
US020120276657A1 (US 2012 / 0 276 657 A1)
DE102004043855B4 (DE 10 2004 043 855 B4)
56NPL citationsCTNPEun Ho Kim, Tae Young Lee, Chee Won Chung: Evolution of Etch Profile of Magnetic Tunnel Junction Stacks Etched in a CH3OH/Ar Plasma. In: Journal of the Electrochemical Society, 159, 212, H230 bis H234.
43Date of first publicationEVTNov 22, 2018
Number of official communications (office actions) 1
Number of responses 1
Date of the first transfer into DPMAregisterEREGTMar 12, 2020
Date of the (most recent) update in DPMAregisterREGTJun 12, 2025
(Show all update days)(Hide all update days)
  • Jun 12, 2025
    • Due date: changed
  • Jun 3, 2025
    • St.36: changed (technical change)
  • Feb 12, 2025
    • St.36: changed (technical change)
  • Mar 12, 2020
    • Date of the first transfer into DPMAregister
Procedural data
No.Kind of procedureLegal statusDate of legal/procedural statusPublication dateAlle Details anzeigen
1 Pre-registration procedure The application is under preliminary examination May 11, 2018  Details anzeigen
2 Procedure relating to PCT application WO first publication with search report Nov 22, 2018  Details anzeigen
3 Examination procedure Request for examination effectively filed Nov 12, 2019  Details anzeigen
4 Pre-registration procedure Pre-registration procedure has been concluded Feb 4, 2020  Details anzeigen
5 Pre-registration procedure Closing PCT nationale phase entry Feb 4, 2020  Details anzeigen
6 New inventor details New/additional inventor details Feb 4, 2020  Details anzeigen
7 New inventor details New/additional inventor details Feb 4, 2020  Details anzeigen
8 Publications Publication of translation of PCT application Mar 12, 2020 Mar 12, 2020 Details anzeigen
9 Examination procedure Official communication on examination Oct 30, 2021  Details anzeigen
10 Examination procedure Reply to official communication Apr 14, 2022  Details anzeigen
11 Change of classification Change of IPC main class Nov 25, 2022 Jan 5, 2023 Details anzeigen
View procedures Pre-registration procedure (No.: 1)
INIDCriterionFieldContent Close details
Type of procedureVARTPre-registration procedure
Legal/procedural statusVSTThe application is under preliminary examination
Date of legal/procedural statusVSTTMay 11, 2018
View procedures Procedure relating to PCT application (No.: 2)
INIDCriterionFieldContent Close details
Type of procedureVARTProcedure relating to PCT application
Legal/procedural statusVSTWO first publication with search report
Date of legal/procedural statusVSTTNov 22, 2018
View procedures Examination procedure (No.: 3)
INIDCriterionFieldContent Close details
Type of procedureVARTExamination procedure
Legal/procedural statusVSTRequest for examination effectively filed
Date of legal/procedural statusVSTTNov 12, 2019
Third party request No
Date of receiptAEGTNov 12, 2019
View procedures Pre-registration procedure (No.: 4)
INIDCriterionFieldContent Close details
Type of procedureVARTPre-registration procedure
Legal/procedural statusVSTPre-registration procedure has been concluded
Date of legal/procedural statusVSTTFeb 4, 2020
View procedures Pre-registration procedure (No.: 5)
INIDCriterionFieldContent Close details
Type of procedureVARTPre-registration procedure
Legal/procedural statusVSTClosing PCT nationale phase entry
Date of legal/procedural statusVSTTFeb 4, 2020
View procedures New inventor details (No.: 6)
INIDCriterionFieldContent Close details
Type of procedureVARTNew inventor details
Legal/procedural statusVSTNew/additional inventor details
Date of legal/procedural statusVSTTFeb 4, 2020
72InventorINPatel, Sahil, Fremont, CA, US
72Previous inventorINFPatel, Sahil, Fremont, CA ., US
View procedures New inventor details (No.: 7)
INIDCriterionFieldContent Close details
Type of procedureVARTNew inventor details
Legal/procedural statusVSTNew/additional inventor details
Date of legal/procedural statusVSTTFeb 4, 2020
72InventorINSundar, Vignesh, Sunnyvale, CA, US
72Previous inventorINFSundar, Vignesh, Sunnyvale, CA., US
View procedures Publications (No.: 8)
INIDCriterionFieldContent Close details
Type of procedureVARTPublications
Legal/procedural statusVSTPublication of translation of PCT application
Date of legal/procedural statusVSTTMar 12, 2020
Issue numberHN11
YearPJ2020
Publication dateVTMar 12, 2020
Type of publicationPARTDocuments
PartHTPart 6
10Published DE documentsDEPNOriginal document: DE112018002498T5
Searchable text: DE112018002498T5
View procedures Examination procedure (No.: 9)
INIDCriterionFieldContent Close details
Type of procedureVARTExamination procedure
Legal/procedural statusVSTOfficial communication on examination
Date of legal/procedural statusVSTTOct 30, 2021
Date of update of the procedureREGTOct 31, 2021
View procedures Examination procedure (No.: 10)
INIDCriterionFieldContent Close details
Type of procedureVARTExamination procedure
Legal/procedural statusVSTReply to official communication
Date of legal/procedural statusVSTTApr 14, 2022
Date of update of the procedureREGTAug 21, 2022
View procedures Change of classification (No.: 11)
INIDCriterionFieldContent Close details
Type of procedureVARTChange of classification
Legal/procedural statusVSTChange of IPC main class
Date of legal/procedural statusVSTTNov 25, 2022
Issue numberHN1
YearPJ2023
Publication dateVTJan 5, 2023
Type of publicationPARTBibliographic data
PartHTPart 2
51IPC main classICM
(ICMV)		 H10N 50/01 (2023.01)
51Previous IPC main classICMF
(ICMVF)		 H01L 43/12 (2006.01)
Date of update of the procedureREGTJan 5, 2023