Master dataINID | Criterion | Field | Content |
---|
| Type of IP right | SART | Patent |
| Status | ST | Pending/in force |
21 | DE file number | DAKZ | 10 2021 120 078.4 |
54 | Designation/title | TI | Halbleiterbauelement mit reduziertem Widerstand und dessen Herstellungsverfahren |
51 | IPC main class | ICM (ICMV) | H01L 23/522 (2006.01) |
51 | IPC secondary class(es) | ICS (ICSV) | H01L 21/768 (2006.01) |
22 | DE application date | DAT | Aug 3, 2021 |
43 | Date of first publication | OT | Nov 10, 2022 |
71/73 | Applicant/owner | INH | Taiwan Semiconductor Manufacturing Co., Ltd., Hsinchu, TW |
72 | Inventor | IN | Duan, Darren, Hsinchu, TW; Chang, Fong-Yuan, Hsinchu, TW; Lu, Chi-Yu, Hsinchu, TW; Huang, Po-Hsiang, Hsinchu, TW; Chen, Chih-Liang, Hsinchu, TW |
74 | Representative | VTR | BOEHMERT & BOEHMERT Anwaltspartnerschaft mbB - Patentanwälte Rechtsanwälte, 28359 Bremen, DE |
10 | Published DE documents | DEPN | Original document:
DE102021120078A1 Searchable text:
DE102021120078A1 |
| Address for service | | BOEHMERT & BOEHMERT Anwaltspartnerschaft mbB - Patentanwälte Rechtsanwälte, 28359 Bremen, DE |
33 31 32
| Foreign priority | PRC PRNA PRDA
| US 63/192,696 May 25, 2021
|
33 31 32
| Foreign priority | PRC PRNA PRDA
| US 63/185,802 May 7, 2021
|
33 31 32
| Foreign priority | PRC PRNA PRDA
| US 17/389,141 Jul 29, 2021
|
| Due date | FT FG | Aug 31, 2025 Annual fee for the 5th year
Patent fees |
| Patent division in charge | | 33 |
56 | Citations | CT |
US020100097875A1 (US 2010 / 0 097 875 A1)
DE102016212796A1 (DE 10 2016 212 796 A1)
DE000060015006T2 (DE 600 15 006 T2)
US020190333853A1 (US 2019 / 0 333 853 A1)
US020150357327A1 (US 2015 / 0 357 327 A1)
US000006522004B1 (US 6 522 004 B1)
|
43 | Date of first publication | EVT | Nov 10, 2022 |
| Number of official communications (office actions) | | 2 |
| Number of responses | | 2 |
| Date of the first transfer into DPMAregister | EREGT | Nov 10, 2022 |
| Date of the (most recent) update in DPMAregister | REGT | Jul 8, 2025 (Show all update days)(Hide all update days)- Jul 8, 2025
- Jun 29, 2025
- Citations: changed
- Procedures: Examination procedure, Decision to grant patent , 28.06.2025: new
- Jun 28, 2025
- Designation/title: changed
- Citations: changed
- Number of responses: changed
- Procedures: Examination procedure, Reply to official communication received, 26.06.2025: new
- Jun 11, 2025
- Jun 7, 2025
- Feb 12, 2025
- Sep 7, 2024
- Jul 18, 2024
- Number of official communications (office actions): changed
- Procedures: Examination procedure, Official communication on examination issued, 17.07.2024: new
- Nov 10, 2022
- Date of the first transfer into DPMAregister
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