Register information Patent

DE file number : 10 2007 040 587.3 (Status: pending/in force, Query started: May 10, 2025)

Please note: This English version is a non-binding translation of the German register excerpt. Only the German version of the register excerpt is legally binding.

Master data
INIDCriterionFieldContent
Type of IP rightSARTPatent
StatusSTPending/in force
21DE file number DAKZ10 2007 040 587.3
54Designation/titleTIHalbleitervorrichtung und Herstellungsverfahren derselben
51IPC main classICM
(ICMV)
H10D 12/01 (2025.01)
51IPC secondary class(es)ICS
(ICSV)
H10D 12/00 (2025.01), H10D 62/10 (2025.01)
22DE application dateDATAug 28, 2007
43Date of first publicationOTJul 31, 2008
Date of publication of grantPETNov 22, 2012
71/73Applicant/ownerINHROHM Co., Ltd., Kyoto, JP
72InventorINHamaguchi, Takuya, Tokyo, JP; Haruguchi, Hideki, Tokyo, JP; Tsunoda, Tetsujiro, Tokyo, JP
74RepresentativeVTRPrüfer & Partner mbB Patentanwälte Rechtsanwalt, 81479 München, DE
10Published DE documentsDEPNOriginal document: DE102007040587A1
Searchable text: DE102007040587A1
Original document: DE102007040587B4
Searchable text: DE102007040587B4
Address for service Prüfer & Partner mbB Patentanwälte Rechtsanwälte, 81479 München, DE
33
31
32
Foreign priorityPRC
PRNA
PRDA
JP
2007-013099
Jan 23, 2007
LicenceLIZWillingness to grant licences to anyone declared
Due dateFT
FG
Aug 31, 2025
Annual fee for the 19th year Patent fees
Patent division in charge 33
57AbstractABEin Verfahren zum Herstellen einer Halbleitervorrichtung gemäß der vorliegenden Erfindung weist einen Schritt zum Ausbilden einer Mehrzahl von MOSFETs, von denen jeder einen Kanal eines ersten Leitungstyps hat, in einem Streifen auf der ersten Hauptoberfläche des Wafers (11) auf, einen Schritt zum Implantieren einer Verunreinigung eines ersten Leitungstyps in die zweite Hauptoberfläche des Wafers (11) und des Durchführens einer Laserausheilungsbehandlung in einem Streifen unter Auslassung äquidistanter Spalte zum Ausbilden einer Pufferschicht (21), welche in einem Streifen aktiviert wurde, einen Schritt des Implantierens einer Verunreinigung eines zweiten Leitungstyps in die zweite Hauptoberfläche des Substrates nach dem Ausbilden der Pufferschicht (21) und des Durchführens einer Laserausheilungsbehandlung auf der gesamten Oberfläche der zweiten Hauptoberfläche zum Ausbilden einer Kollektorschicht (22) und zum Aktivieren der Pufferschicht (21) und einen Schritt zum Ausbilden einer Emitterelektrode (23) auf der ersten Hauptoberfläche und zum Ausbilden einer Kollektorelektrode (24) auf der zweiten Hauptoberfläche.
56CitationsCT DE102005021249A1 (DE 10 2005 021 249 A1)
DE000010330571A1 (DE 103 30 571 A1)
DE000010302628A1 (DE 103 02 628 A1)
DE000069610970T2 (DE 696 10 970 T2)
US000006274892B1 (US 6 274 892 B1)
DE000069026184T2 (DE 690 26 184 T2)
43Date of first publicationEVTJul 31, 2008
Number of official communications (office actions) 1
Number of responses 1
Date of the first transfer into DPMAregisterEREGTMay 26, 2011
Date of the (most recent) update in DPMAregisterREGTJan 2, 2025
(Show all update days)(Hide all update days)
  • Jan 2, 2025
    • IPC main class: changed
    • IPC secondary class(es): changed
    • Procedures: Change of classification, Change of IPC main class, 22.11.2024: new
  • Sep 11, 2024
    • St.36: changed (technical change)
  • Jul 11, 2024; Apr 13, 2024; Mar 5, 2024; Aug 26, 2023; Jul 10, 2023; Feb 18, 2023; Jul 7, 2022; Jul 23, 2021; Jan 15, 2021; Dec 8, 2020; Aug 24, 2020; Sep 6, 2019; Aug 21, 2019; Sep 6, 2018; Aug 31, 2017; Sep 7, 2016; Dec 18, 2015; Sep 8, 2015; Sep 5, 2015; Nov 15, 2014; Sep 9, 2014; Sep 3, 2014; Mar 1, 2014; Sep 10, 2013; Aug 29, 2013; Aug 1, 2013; May 29, 2013; Apr 11, 2013; Mar 26, 2013; Jan 31, 2013; Nov 27, 2012; Nov 22, 2012; Oct 2, 2012; Sep 18, 2012; Sep 5, 2012; Aug 23, 2012; Aug 17, 2012; Aug 15, 2012; Aug 4, 2012; Jul 21, 2012; Jul 20, 2012; Jul 18, 2012; Jul 17, 2012; Jul 14, 2012; Jul 13, 2012; Jul 11, 2012; May 22, 2012; Jan 4, 2012; Sep 21, 2011; Sep 6, 2011; Jul 19, 2011
    • Historical data not available for this/these date(s)
  • May 26, 2011
    • Date of the first transfer into DPMAregister
Procedural data
No.Kind of procedureLegal statusDate of legal/procedural statusPublication dateAlle Details anzeigen
1 Pre-registration procedure The application is under preliminary examination Aug 28, 2007  Details anzeigen
2 Examination procedure Request for examination effectively filed Aug 28, 2007  Details anzeigen
3 Pre-registration procedure Pre-registration procedure has been concluded Sep 25, 2007  Details anzeigen
4 Publications Publication of application (Offenlegungsschrift) Jul 31, 2008 Jul 31, 2008 Details anzeigen
5 Examination procedure Reply to official communication Aug 5, 2009  Details anzeigen
6 Examination procedure Decision to grant patent by Examining Section/Patent Division Jul 19, 2012  Details anzeigen
7 Publications Patent specification Nov 22, 2012 Nov 22, 2012 Details anzeigen
8 Examination procedure Grant of patent has become final Feb 23, 2013 May 29, 2013 Details anzeigen
9 Licence Willingness to grant licences declared Nov 7, 2014 Dec 24, 2014 Details anzeigen
10 New applicant/owner details New applicant/owner details Dec 7, 2020 Jan 14, 2021 Details anzeigen
11 Change of classification Change of IPC main class Nov 22, 2024 Jan 2, 2025 Details anzeigen
View procedures Pre-registration procedure (No.: 1)
INIDCriterionFieldContent Close details
Type of procedureVARTPre-registration procedure
Legal/procedural statusVSTThe application is under preliminary examination
Date of legal/procedural statusVSTTAug 28, 2007
View procedures Examination procedure (No.: 2)
INIDCriterionFieldContent Close details
Type of procedureVARTExamination procedure
Legal/procedural statusVSTRequest for examination effectively filed
Date of legal/procedural statusVSTTAug 28, 2007
Third party request No
Date of receiptAEGTAug 28, 2007
View procedures Pre-registration procedure (No.: 3)
INIDCriterionFieldContent Close details
Type of procedureVARTPre-registration procedure
Legal/procedural statusVSTPre-registration procedure has been concluded
Date of legal/procedural statusVSTTSep 25, 2007
View procedures Publications (No.: 4)
INIDCriterionFieldContent Close details
Type of procedureVARTPublications
Legal/procedural statusVSTPublication of application (Offenlegungsschrift)
Date of legal/procedural statusVSTTJul 31, 2008
Issue numberHN31
YearPJ2008
Publication dateVTJul 31, 2008
Type of publicationPARTDocuments
PartHTPart 2
10Published DE documentsDEPNOriginal document: DE102007040587A1
Searchable text: DE102007040587A1
View procedures Examination procedure (No.: 5)
INIDCriterionFieldContent Close details
Type of procedureVARTExamination procedure
Legal/procedural statusVSTReply to official communication
Date of legal/procedural statusVSTTAug 5, 2009
View procedures Examination procedure (No.: 6)
INIDCriterionFieldContent Close details
Type of procedureVARTExamination procedure
Legal/procedural statusVSTDecision to grant patent by Examining Section/Patent Division
Date of legal/procedural statusVSTTJul 19, 2012
View procedures Publications (No.: 7)
INIDCriterionFieldContent Close details
Type of procedureVARTPublications
Legal/procedural statusVSTPatent specification
Date of legal/procedural statusVSTTNov 22, 2012
Issue numberHN47
YearPJ2012
Publication dateVTNov 22, 2012
Type of publicationPARTDocuments
PartHTPart 3
10Published DE documentsDEPNOriginal document: DE102007040587B4
Searchable text: DE102007040587B4
View procedures Examination procedure (No.: 8)
INIDCriterionFieldContent Close details
Type of procedureVARTExamination procedure
Legal/procedural statusVSTGrant of patent has become final
Date of legal/procedural statusVSTTFeb 23, 2013
Issue numberHN22
YearPJ2013
Publication dateVTMay 29, 2013
Type of publicationPARTBibliographic data
PartHTPart 3
View procedures Licence (No.: 9)
INIDCriterionFieldContent Close details
Type of procedureVARTLicence
Legal/procedural statusVSTWillingness to grant licences declared
Date of legal/procedural statusVSTTNov 7, 2014
Issue numberHN52
YearPJ2014
Publication dateVTDec 24, 2014
Type of publicationPARTBibliographic data
PartHTPart 3
Date of update of the procedureREGTFeb 18, 2023
View procedures New applicant/owner details (No.: 10)
INIDCriterionFieldContent Close details
Type of procedureVARTNew applicant/owner details
Legal/procedural statusVSTNew applicant/owner details
Date of legal/procedural statusVSTTDec 7, 2020
Issue numberHN2
YearPJ2021
Publication dateVTJan 14, 2021
Type of publicationPARTBibliographic data
PartHTPart 3
71/73Applicant/ownerINHROHM Co., Ltd., Kyoto, JP
71/73Previous applicant/ownerINHFMitsubishi Electric Corp., Tokyo, JP
Date of update of the procedureREGTApr 13, 2024
View procedures Change of classification (No.: 11)
INIDCriterionFieldContent Close details
Type of procedureVARTChange of classification
Legal/procedural statusVSTChange of IPC main class
Date of legal/procedural statusVSTTNov 22, 2024
Issue numberHN1
YearPJ2025
Publication dateVTJan 2, 2025
Type of publicationPARTBibliographic data
PartHTPart 3
51IPC main classICM
(ICMV)
H10D 12/01 (2025.01)
51Previous IPC main classICMF
(ICMVF)
H01L 21/331 (2006.01)
Date of update of the procedureREGTJan 2, 2025